אסיף מאגר המחקר החקלאי

Radical-molecule and ion-molecule mechanisms in the polymerization of hydrocarbons and chlorosilanes in r.f. plasmas at low pressures (below 1.0 Torr)

Year:

1984

Source of publication :

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Volume :

118

Co-Authors:

Avni, R., Lewis Research Center, National Aeronautics and Space Administration, Cleveland, OH 44135, United States
Carmi, U., Nuclear Research Centre Negev, Beer-Sheva, Israel
Inspektor, A., Nuclear Research Centre Negev, Beer-Sheva, Israel
Rosenthal, I., Nuclear Research Centre Negev, Beer-Sheva, Israel

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Abstract:

Ion-molecule and radical-molecule mechanisms are responsible for the dissociation of hydrocarbons and chlorosilane monomers and for the formation of polymerized species in the plasma state of an r.f. discharge. In the plasma of a mixture of the monomer with argon the rate-determining step for both dissociation and polymerization is governed by an interaction of the ion-molecule type. The addition of H2 or NH3 to the monomer-argon mixture converts the rate-determining step from an ion-molecule interaction to a radical-molecule interaction for both monomer dissociation and polymerization processes. © 1984.

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