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The Role of Hydrogen in the Radical Polymerization Mechanism of Hydrocarbons and Chlorosilanes in a Low Pressure Microwave Plasmaa)
Year:
1985
Authors :
Rosenthal, Ionel
;
.
Volume :
3
Co-Authors:
Avni, R., Division of Chemistry, NRC-Negev, P. O. Box 9001, Beer-Sheva 84190, Israel
Carmi, U., Division of Chemistry, NRC-Negev, P. O. Box 9001, Beer-Sheva 84190, Israel
Inspektor, A., Division of Chemistry, NRC-Negev, P. O. Box 9001, Beer-Sheva 84190, Israel
Rosenthal, I., Division of Chemistry, NRC-Negev, P. O. Box 9001, Beer-Sheva 84190, Israel
Facilitators :
From page:
1813
To page:
1820
(
Total pages:
8
)
Abstract:
The introduction of propylene (C3H6) or tetrachlorosilane (SiCl4) in concentrations of 3–10 vol.% into a microwave (2.45 GHz) plasma of Ar or mixtures of Ar + H2, at low pressures (1–10 Torr) and flow velocity in the range of 103cm-s_1results with the formation of solid carbon (pyrocarbon) or silicon, respectively. In the plasma state, both hydrocarbons and chlorosilanes, dissociate and polymerize to Cx Hy and SiCl, forms with x> 1 and x>y. It was found that polymerization process in the Ar (without H2) microwave plasma was mainly propagated by an ion-molecule mechanism, while additions of H2 (6–20 vol.%) to the Ar plasma propagates the polymerization mainly by a radical mechanism. The two mechanisms were determined by sampling the microwave plasmas with a quadrupole mass spectrometer (QMS), by indirect measurement of the plasmas free radicals concentration in an electron paramagnetic resonance (EPR) spectrometer and by measuring the deposition rate of pyrocarbon and silicon on substrates floated, grounded or biased to minus 100 V. © 1985, American Vacuum Society. All rights reserved.
Note:
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DOI :
10.1116/1.573385
Article number:
Affiliations:
Database:
Scopus
Publication Type:
article
;
.
Language:
English
Editors' remarks:
ID:
29731
Last updated date:
02/03/2022 17:27
Creation date:
17/04/2018 00:49
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The Role of Hydrogen in the Radical Polymerization Mechanism of Hydrocarbons and Chlorosilanes in a Low Pressure Microwave Plasmaa)
3
Avni, R., Division of Chemistry, NRC-Negev, P. O. Box 9001, Beer-Sheva 84190, Israel
Carmi, U., Division of Chemistry, NRC-Negev, P. O. Box 9001, Beer-Sheva 84190, Israel
Inspektor, A., Division of Chemistry, NRC-Negev, P. O. Box 9001, Beer-Sheva 84190, Israel
Rosenthal, I., Division of Chemistry, NRC-Negev, P. O. Box 9001, Beer-Sheva 84190, Israel
The Role of Hydrogen in the Radical Polymerization Mechanism of Hydrocarbons and Chlorosilanes in a Low Pressure Microwave Plasmaa)
The introduction of propylene (C3H6) or tetrachlorosilane (SiCl4) in concentrations of 3–10 vol.% into a microwave (2.45 GHz) plasma of Ar or mixtures of Ar + H2, at low pressures (1–10 Torr) and flow velocity in the range of 103cm-s_1results with the formation of solid carbon (pyrocarbon) or silicon, respectively. In the plasma state, both hydrocarbons and chlorosilanes, dissociate and polymerize to Cx Hy and SiCl, forms with x> 1 and x>y. It was found that polymerization process in the Ar (without H2) microwave plasma was mainly propagated by an ion-molecule mechanism, while additions of H2 (6–20 vol.%) to the Ar plasma propagates the polymerization mainly by a radical mechanism. The two mechanisms were determined by sampling the microwave plasmas with a quadrupole mass spectrometer (QMS), by indirect measurement of the plasmas free radicals concentration in an electron paramagnetic resonance (EPR) spectrometer and by measuring the deposition rate of pyrocarbon and silicon on substrates floated, grounded or biased to minus 100 V. © 1985, American Vacuum Society. All rights reserved.
Scientific Publication
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