נגישות
menu      
Advanced Search
Syntax
Search...
Volcani treasures
About
Terms of use
Manage
Community:
אסיף מאגר המחקר החקלאי
Powered by ClearMash Solutions Ltd -
Physiological Characterization of Young ‘Hass’ Avocado Plant Leaves Following Exposure to High Temperatures and Low Light Intensity
Year:
2021
Source of publication :
Plants
Authors :
Volume :
10
Co-Authors:
Or Shapira

Simon Chernoivanov

Itamar Neuberger

Shay Levy

Lior Rubinovich

 

Facilitators :
From page:
0
To page:
0
(
Total pages:
1
)
Abstract:

The worldwide demand for avocados has resulted in the planting of millions of young plants each year. However, global warming, resulting in high temperatures, sensed as heat stress, may severely damage these new plantings. The objective of this study was to assess the risks of heat stress on young avocado plants. We aimed to characterize different physiological parameters of young ‘Hass’ plant leaves following exposure to high temperatures under low light (LL) intensity and to pinpoint the temperature threshold for significant heat stress damage in these plants. To this end, young potted plants were subjected to different temperature gradients in a controlled-climate chamber. Minor and severe leaf damage was apparent in plants subjected to the 51 °C and 53 °C treatments, respectively. Minor and vast reductions in optimal quantum yield efficiency of photosystem II (Fv/Fm) values were observed in plants subjected to 51 °C and 53 °C, respectively. Heat stress treatments significantly reduced CO2 assimilation in plants subjected to 49 °C and higher temperatures. Stomatal conductance to water vapour and substomatal internal CO2 concentration were less sensitive to the heat treatments. These results imply that the heat damage threshold for young avocado plants under LL conditions is between 49 °C and 51 °C, whereas at 53 °C, severe and irreversible leaf damage occurs. 

Note:
Related Files :
carbon assimilation
heat stress
Leaf damage
Persea americana
Stomatal conductance
subtropic
Show More
Related Content
More details
DOI :
10.3390/plants10081562
Article number:
0
Affiliations:
Database:
Scopus
Publication Type:
article
;
.
Language:
English
Editors' remarks:
ID:
55877
Last updated date:
02/03/2022 17:27
Creation date:
08/08/2021 17:57
You may also be interested in
Scientific Publication
Physiological Characterization of Young ‘Hass’ Avocado Plant Leaves Following Exposure to High Temperatures and Low Light Intensity
10
Or Shapira

Simon Chernoivanov

Itamar Neuberger

Shay Levy

Lior Rubinovich

 

Physiological Characterization of Young ‘Hass’ Avocado Plant Leaves Following Exposure to High Temperatures and Low Light Intensity

The worldwide demand for avocados has resulted in the planting of millions of young plants each year. However, global warming, resulting in high temperatures, sensed as heat stress, may severely damage these new plantings. The objective of this study was to assess the risks of heat stress on young avocado plants. We aimed to characterize different physiological parameters of young ‘Hass’ plant leaves following exposure to high temperatures under low light (LL) intensity and to pinpoint the temperature threshold for significant heat stress damage in these plants. To this end, young potted plants were subjected to different temperature gradients in a controlled-climate chamber. Minor and severe leaf damage was apparent in plants subjected to the 51 °C and 53 °C treatments, respectively. Minor and vast reductions in optimal quantum yield efficiency of photosystem II (Fv/Fm) values were observed in plants subjected to 51 °C and 53 °C, respectively. Heat stress treatments significantly reduced CO2 assimilation in plants subjected to 49 °C and higher temperatures. Stomatal conductance to water vapour and substomatal internal CO2 concentration were less sensitive to the heat treatments. These results imply that the heat damage threshold for young avocado plants under LL conditions is between 49 °C and 51 °C, whereas at 53 °C, severe and irreversible leaf damage occurs. 

Scientific Publication
You may also be interested in